"Detailed technical specifications for our in-house agile micro-fab. We support R&D from single-process runs to complex multi-layer device prototyping."
Electron Beam Lithography (EBL)
>10 nm resolution, high-precision overlay
UV Photolithography / Stepper
G/H/I-line support, sub-micron patterning
Nanoimprint Lithography (NIL)
High-throughput replication for metasurfaces
Direct Laser Writing (DLW)
3D micro-structuring and rapid prototyping
Ready to fabricate?
Submit your design rules check (DRC) or GDSII file for a feasibility review.
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